ATC Orion 5 RF/DC Sputtering System (AJA International)
Features:
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Main Deposition Chamber: 14.6" high x 12" OD, S/S vacuum chamber.
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Con-Focal Sputtering: three 2'' magnetron sputter guns with integral isolation chimneys.
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DC and RF Generators: two 300 Watt RF generators and one 750 Watt DC generator.
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Quartz Crystal Thickness Monitor.
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Substrate Holder: accommodates substrates up to 4" diameter; mounts to top of chamber for sputter up orientation; continous motorized rotation (0-40RPM) with controller; radiant heating to 850 C with quartz halogen lamps (+/- 1 degree C temp. stability); capable of being heated in an O2 environment;
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Gas Handling: mass flow controlled gas line (Ar) - 20 sccm with pneumatic isolation valve(s) and filter.
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Deposition Uniformity: typically +/- 2.5% thickness uniformity over a 4'' diameter substrates.
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Base Chamber Vacuum: better than or equal to 3.0脳10-8 Torr.
Savannah 100 ALD (UltraTech / Cambridge NanoTech)
Features:
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Substrate Size: up to 200 mm
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Substrate Temperature: 25掳C - 500掳C; 卤0.2掳C
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Precursor Sources: Up to 6, heated
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Deposition Uniformity:&苍产蝉辫;&濒迟;卤1%
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Deposition: High speed/ultra high aspect ratio
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Control: Labview-USB-PC
UHV PLD System
3118 E-beam evaporator (Varian)
